A unique combination of Pall's leading edge AresKleen™ purification material combined with Ultramet-L® stainless steel filter media creating the industry's most advanced true point-of-use purifier.
The Gaskleen® II Purifier assembly is designed to remove contamination from most process gases. Sub ppb level purification is achieved at designed flow rates of up to 3 slpm while providing 0.003 μm filtration.
The Gaskleen® II Purifier assembly is designed to remove contamination from most process gases. Sub ppb level purification is achieved at designed flow rates of up to 3 slpm while providing 0.003 μm filtration.
- Controls and reduces impurities such as O2, H2O, CO2, CO, NMHC, Ni(CO)4 and Fe(CO)5
- One-for- one dimensional replacement of conventional in-line particle filter assemblies
- Assembly hardware is made of 316 L stainless steel
- High efficiency diffusion barrier ensures integrity of reactive material during installation
- Superior pressure drop characteristics
- Wide variety of gases purified
- 100% helium leak and pressure tested
- Compact size
- Not orientation sensitive
- Does not generate hazardous waste when used in non-hazardous gas service
- Will not release hydrocarbons
- No detectable metal contribution above background in HCl gas with HCLP material
- No detectable metal contribution above background in HBr gas with HBRP material
Materials
- Electropolished 316 L stainless steel components
- ≤ 10 μin / 0.25 μm Ra internal surface finish
Particle Removal Efficiency Rating
- 1x109 retention of particles ≥ 0.003 μm up to 5 slpm
Connections
- 1⁄4 in. Gasket Seal, Male/Male (VCR1 compatible)
Operating Conditions
- Maximum Operating Pressure: 1000 psig / 69 bar
- Maximum operating temperature:
- 100 °C / 212 °F (INP, SIP, FCP, SF6P)
- 40 ˚C / 104 ˚F (GEH4P, OXP, CLXP, HCLP, HBRP, CDAP)
- EU Pressure Equipment Directive: Assemblies have been evaluated and are CE marked per the European Union's Pressure Equipment Directive 2014/68/EU
Design Flow Rate
- 0- 3 slpm @ 15 psig / 1 bar
- Higher intermittent flow rates of up to 5 slpm can be accommodated with reduced lifetime2
Packaging
- Double bagged
- Outer bag: aluminized mylar3
- Inner bag: polyethylene
- End fittings capped with metal seals
- Product packaged in an argon environment
Dimensions
- Length: 3.31 in. / 84 mm
- Diameter: 1.36 in. / 34.5 mm
1 VCR is a trademark of Swagelok Co.
2 Contact the Pall Microelectronics Group for further information.
3 Mylar is a registered trademark of Dupont Teijin Films.
Technical Information
Impurity Removal as Tested in Specific Gases| Specific Gas | Impurity Removal Efficiency |
| Inert Gases: Nitrogen, Argon, Helium, Xenon, Krypton, Neon | < 1 ppb H2O, CO2, O2, and CO as tested in argon and nitrogen using APIMS analyzer |
| Flammable Gases: Silane, Hydrogen, Methane, Ethane, Cyclopropane, Propane, Dimethyl Ether | < 1 ppb H2O, CO2, O2, and CO as tested in argon, nitrogen and hydrogen using APIMS analyzer < 1 ppb H2O as tested in carbon monoxide using trace moisture analyzer H2O and siloxanes removed to trace levels as tested in silane using APIMS |
| Carbon Monoxide | < 1 ppb Ni(CO)4, and < 1 ppb Fe(CO)5 as tested in carbon monoxide using GC-ECD analyzer |
| Fluoromethane, Difluoromethane, Trifluoromethane, Tetrafluoroethane, Pentafluoroethane, Heptafluoropropane, Carbon Tetrafluoride, Perfluoropropane, Perfluorocyclobutane, Hexafluoroethane | < 1 ppb H2O, CO2, O2, and CO as tested in argon and nitrogen using APIMS analyzer < 1 ppb O2 as tested in trifluoromethane using trace oxygen analyzer < 10 ppb H2O as tested in trifluoromethane using trace moisture analyzer and FTIR |
| Germane | < 1 ppb H2O, CO2, O2, and CO as tested in argon and nitrogen using APIMS analyzer |
| Sulfur Hexafluoride | < 1 ppb H2O, CO2, and O2 as tested in argon using APIMS |
| Oxygenated Gases: Carbon Dioxide, Oxygen, Nitrous Oxide, Clean Dry Air | < 10 ppb H2O < 1 ppb H2O, and CO2, as tested in argon using APIMS analyzer |
| Chlorinated Gases: Boron Trichloride, Chlorine, Trichlorosilane, Dichlorosilane | < 100 ppb H2O < 1 ppb H2O, and CO2, as tested in argon using APIMS analyzer |
| Hydrogen chloride | < 15 ppb H2O as tested in hydrogen chloride using CRDS < 1 ppb H2O as tested in argon using APIMS analyzer |
| Hydrogen Bromide | < 50 ppb H2O as tested in hydrogen bromide using CRDS < 1 ppb H2O as tested in argon using APIMS analyzer |
| Photolithography clean dry air | < 1 ppb H2O as tested in argon using APIMS analyzer < 300 ppt C4H8 as tested in argon using APIMS Analyzer < 10 ppt SO2 as tested in nitrogen using ion chromatograph < 15 ppt NH3 as tested in nitrogen using ion chromatograph < 1 ppt HMDSO as tested in argon using APIMS analyzer and baseline subtraction |
Unit conversion: 1 bar = 100 kilopascals
Pressure Drop vs. Gas Flow Rate
Lifetime Calculations
Pall AresKleen Purification Material: Inert Gas ServiceGaskleen II Purifier Assembly, Part # GLP2INPVMM4
Inlet Pressure: 30 psig (2.1 bar) Contaminant Challenge as H2O
Pall AresKleen Purification Material: Inert Gas Service Gaskleen II Purifier Assembly, Part # GLP2INPVMM4
Inlet Pressure: 30 psig (2.1 bar) Contaminant Challenge as O2
Systems
Process gas purification, Process gas purification, Process gas purification
Dimensions
| Part Number | Specific Gas | Effluent Purity Specifications |
| GLP2INPVMM4 | Inert Gases: Nitrogen, Argon, Helium, Xenon, Krypton, Neon | < 1 ppb H2O, O2, CO2, CO |
| GLP2SIPVMM4 | Flammable Gases: Silane, Hydrogen, Methane, Ethane, Cyclopropane, Propane, Dimethyl Ether | < 1 ppb H2O, CO2, O2, CO |
| Carbon Monoxide | < 1 ppb H2O, O2, CO2, Ni(CO)4, Fe(CO)5 | |
| GLP2FCPVMM4 | Fluoromethane, Difluoromethane, Trifluoromethane, Tetrafluoroethane, Pentafluoroethane, Heptafluoropropane, Carbon Tetrafluoride, Perfluoropropane, Perfluorocyclobutane, Hexafluoroethane | < 1 ppb H2O, CO2, O2 |
| GLP2GEH4PVMM4 | Germane | < 1 ppb H2O, CO2, O2, CO |
| GLP2SF6PVMM4 | Sulfur Hexafluoride | < 1 ppb H2O, CO2, O2, CO |
| GLP2OXPVMM4 | Oxygenated Gases: Carbon Dioxide, Oxygen, Nitrous Oxide | < 10 ppb H2O |
| GLP2CLXPVMM4 | Chlorinated Gases: Boron Trichloride, Chlorine, Trichlorosilane, Dichlorosilane | < 100 ppb H2O |
| GLP2HCLPVMM4 | Hydrogen Chloride | < 15 ppb H2O |
| GLP2HBRPVMM4 | Hydrogen Bromide | < 50 ppb H2O |
| GLP2CDAPVMM4 | Photolithography clean dry air | < 1 ppb H2O, < 300 ppt organics (as C4), < 10 ppt acid gases (as SO2), < 15 ppt basic gases (as NH3), < 1 ppt refractory compounds (as HMDSO) |
Unit conversion: 1 bar = 100 kilopascals
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