The newly developed Ulti-Etch filter is designed to improve recirculating etch bath cleanup performance.
Increased wafer diameters have caused bath volumes and pump sizes to also increase. This has created higher face velocities through recirculating etch bath filters.
Utilizing the latest advance in Pall filtration technology, the crescent shaped Ultipleat® filter design, has enabled us to improve our rapid bath clean up performance characteristics.
Increased wafer diameters have caused bath volumes and pump sizes to also increase. This has created higher face velocities through recirculating etch bath filters.
Utilizing the latest advance in Pall filtration technology, the crescent shaped Ultipleat® filter design, has enabled us to improve our rapid bath clean up performance characteristics.
- Rapid bath cleanup with particle challenge
- Spontaneously wets in BOE (HF/NH4F mixture)
- Very high flow rates
- Rapid bath turnover
- No prewetting required
- Excellent particle removal
- Hydrophilization modification is chemically bonded, not coated
- Low extractables
- Manufactured in a cleanroom environment
Materials
- Medium: Hydrophilic PVDF
- Core, cage, and end caps: Polypropylene
- Support and drainage: Polypropylene O-ring options: Viton1 A and Teflon1 encapsulated Viton
Removal Rating
- 0.1 μm in recirculation mode
Configurations
- Nominal length: 10 in. / 254 mm
- Diameter: 2.75 in. / 70 mm
- O-ring size / end caps: Code 3 (222 double O-ring / flat end)
Operating Conditions
- Maximum Temperature: 165 °F / 75 °C
- Maximum Differential Pressure: 30 psid / 2 bar
1 Viton and Teflon are trademarks of DuPont Dow Elastomers
Pressure Drop vs. Liquid Flow Rate2
2 For liquids with viscosity differing from water, multiply the pressure drop by the viscosity in centipoise.
Typical Performance Characteristics3
3 Cleanup of 200 mm Etch Bath after Particle Challenge .33 Hp Pump, 38.5 liter Recirculating Etch Bath. Counts monitored with PMS M65. PMS - Particle Measuring Systems, Boulder, CO.
Filter Cartridges
Chemicals
| Part Number | Nominal Length (in. / mm) | O-Ring Material4 |
| AB1UVI3EHF | 10 / 254 | Viton A |
| AB1UVI3EH1 | 10 / 254 | Teflon Encapsulated Viton |
| MR1UVI3EHF | 10 / 254 | Viton A |
| MR1UVI3EH1 | 10 / 254 | Teflon Encapsulated Viton |
4 Other O-ring materials are available.
Unit conversion: 1 bar = 100 kilopascals
Semiconductor
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