Mega-Etch Filter product photo Primary L

Mega-Etch Filter

The Mega-Etch filter has been designed for HF and BOE recirculation bath processing. 

The patented highly asymmetric polysulfone membrane enables very high flow rates and fine filtration with minimal demand on limited pumping capacity. The end result is fast starts, excellent particle retention, low microbubble potential, and superior bath quality.

When operated at ambient temperature, the Mega-Etch filter is compatible with a wide range of etch solutions and semiaqueous strippers that are primarily HF based.1

It is highly recommended for use in SiO2 etch with surfactant and low horsepower internal pumps.

For spontaneous wetting in high surface tension fluid, the Ulti-Etch filter can be used.

Features and Benefits

  • Excellent retention
  • Very high flow rates
  • Rapid bath turnover
  • Low extractable
  • Ultralow metal ion extractables option
  • No prewetting with IPA required
  • Manufactured in a cleanroom environment
  • 100% integrity tested
1The Mega-Etch filter should be tested before installation to determine compatibility.


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描述
The Mega-Etch filter has been designed for HF and BOE recirculation bath processing. 

The patented highly asymmetric polysulfone membrane enables very high flow rates and fine filtration with minimal demand on limited pumping capacity. The end result is fast starts, excellent particle retention, low microbubble potential, and superior bath quality.

When operated at ambient temperature, the Mega-Etch filter is compatible with a wide range of etch solutions and semiaqueous strippers that are primarily HF based.1

It is highly recommended for use in SiO2 etch with surfactant and low horsepower internal pumps.

For spontaneous wetting in high surface tension fluid, the Ulti-Etch filter can be used.

Features and Benefits

  • Excellent retention
  • Very high flow rates
  • Rapid bath turnover
  • Low extractable
  • Ultralow metal ion extractables option
  • No prewetting with IPA required
  • Manufactured in a cleanroom environment
  • 100% integrity tested
1The Mega-Etch filter should be tested before installation to determine compatibility.
规格

Materials of Construction

  • Medium: Highly asymmetric hydrophilic polysulfone
  • Core, Cage, and End Caps: Polypropylene
  • Support: Polypropylene
  • O-Ring: Fluoroelastomer A (standard)

Removal Ratings

  • 0.45 μm (0.1 μm RP), 0.2 μm, 0.1 μm, 0.05 μm

Filter Areas

  • 254 mm / 10 in (0.65 m2 / 7.0 ft.2)
  • 508 mm / 20 in (1.30 m2 / 14.0 ft.2)

Configurations

  • Nominal Length: 25.4 cm / 10 in., 50.8 cm / 20 in.
  • Diameter: 6.6 cm / 2.6 in.

Operating Conditions

  • Maximum Operating Temperature: 95 °C / 203 °F
  • Maximum Forward Differential Pressure: 0.345 MPa (50 psid) @ 20 °C (60 °F)
性能

Pressure Drop vs. Liquid Flow Rate2



2For liquids with a viscosity differing from water, multiply the pressure drop by the viscosity in centipoise.
类型
Filter Cartridges
应用
Chemicals, Wet etch & cleans
订购信息

EBC [1] [2] [3] [4]

Table 1 - Removal Ratings in Microns (μm)
 
Code  Removal Ratings (μm)
050 0.05
100 0.1
200 0.2
450 0.45 (0.1 RP)
 

Table 2 - Cartridge Lengths
 
Code Cartridge Lengths
10 254 mm / 10 in.
 20 508 mm / 20 in.
 

Table 3 - End Configurations
 
Code End Configurations
M3 SOE flat closed end; external 222 O-rings
M7 SOE fin end; external 226 O-rings
M8 SOE fin end; external 222 O-rings
 

Table 4 - End Configurations
 
Code End Configurations
V Fluoroelastomer A (standard)
T FEP encapsulated silicone
F FEP encapsulated fluoroelastomer
C Chemraz3
 

3Chemraz is a registered trademark of Greene Tweed and Co.

分类信息
Semiconductor, Data Storage